Chemical Absorption of Nitrogen Trifluoride Emissions from Semiconductor Etching Process Exhaust Streams

Abstract

Nitrogen trifluoride (NF₃) is widely used in semiconductor manufacturing processes for chamber cleaning and plasma etching applications; however, its release into the atmosphere poses significant environmental concerns due to its high global warming potential and long atmospheric lifetime. This study investigates the chemical absorption of NF₃ emissions from semiconductor etching process exhaust streams using an advanced wet scrubbing system designed for efficient pollutant capture and treatment. The research focuses on evaluating the absorption efficiency under varying operational parameters, including absorbent concentration, gas flow rate, contact time, temperature, and pH conditions. Experimental analyses and process simulations were conducted to examine mass transfer behavior, reaction kinetics, and gas–liquid interaction mechanisms influencing NF₃ removal performance. The results indicate that optimized chemical absorption significantly enhances NF₃ removal efficiency while reducing gaseous emissions from semiconductor processing facilities. The study further demonstrates that appropriate selection of absorbents and operating conditions improves reaction stability, minimizes secondary pollutant formation, and enhances overall treatment effectiveness. Kinetic evaluation confirmed that the absorption process is governed by both diffusion and chemical reaction mechanisms within the scrubbing system. Comparative analysis with conventional emission control methods revealed that chemical absorption provides superior environmental performance and operational reliability for semiconductor exhaust treatment applications. The proposed approach supports sustainable semiconductor manufacturing by reducing greenhouse gas emissions and improving industrial air pollution control practices. The findings highlight the importance of advanced emission treatment technologies for achieving regulatory compliance and promoting environmentally responsible operation in high-technology manufacturing industries.