Plasma-Assisted Chemical Vapor Deposition of Catalytic Coatings for Enhanced Photocatalytic Reactor Performance

Abstract

The performance of photocatalytic reactors is strongly influenced by the surface properties, stability, and catalytic activity of the coating materials employed in pollutant degradation processes. This study investigates the plasma-assisted chemical vapor deposition (PACVD) of catalytic coatings for enhancing photocatalytic reactor performance in environmental and industrial treatment applications. The proposed deposition approach integrates plasma-enhanced surface activation with controlled chemical vapor deposition to produce uniform, high-adhesion catalytic coatings with improved photocatalytic efficiency. A comprehensive experimental investigation was conducted to evaluate the effects of plasma power, deposition temperature, precursor concentration, gas flow rate, and coating thickness on surface morphology, structural characteristics, and photocatalytic activity. Advanced characterization techniques confirmed the formation of nanostructured catalytic layers exhibiting enhanced surface area, improved crystallinity, and strong substrate adhesion suitable for long-term reactor operation. Performance analysis demonstrated significant improvements in light absorption capability, reactive species generation, and degradation efficiency of organic contaminants compared to conventionally coated reactor surfaces. The plasma-assisted deposition process also contributed to enhanced coating durability, reduced surface defects, and improved resistance to chemical degradation under continuous operational conditions. Furthermore, the optimized catalytic coatings facilitated superior mass transfer interaction and accelerated photocatalytic reaction kinetics within the reactor system. Comparative assessments indicated improved pollutant mineralization efficiency and operational stability in photocatalytic treatment processes utilizing PACVD-based coatings.